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EPL mask fabrication

Author(s):
Lercel, M.J. ( IBM Microelectronics Div. (USA) )
Williams, C.T.
Lawliss, M.
Ackel, R.
Kindt, L.
Fisch, E.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
790
Page(to):
798
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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