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Defect dispositiong using mask printability analysis on alternating phase-shifting masks

Author(s):
Chang, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Hsieh, C.-H.
Tzu, S.-D.
Dai, C.-M.
Lin, B. J.
Pang, L. ( Numerical Technologies, Inc. (USA) )
Qian, Q.-D.
Chen, J.-H.
Huang, J. H.
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
622
Page(to):
629
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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