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Defect printability analysis on alternating phase-shifting masks

Author(s):
Pang, L. ( Numerical Technologies, Inc. (USA) )
Qian, Q.-D.
Chan, K.K.
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishiguchi, M.
Hayashi, N.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
614
Page(to):
621
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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