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Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Author(s):
Jeong, W.-G. ( PKL (Korea) )
Kim, D.-W.
Park, C.-M.
An, K.-W.
Lee, D.-H.
Kim, J.-M.
Choi, S.-S.
Jeong, S.H.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
597
Page(to):
605
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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