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Hard pellicle study for 157-nm lithography

Author(s):
Shu, E.Y. ( Intel Corp. (USA) )
Lo, F.-C.
Eschbach, F.O.
Cotte, E.P. ( Univ. of Wisconsin/Madison (USA) )
Engelstand, R.L.
Lovell, E.G.
Okada, K. ( Asahi Glass Co. Ltd. (Japan) )
Kikugawa, S.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
558
Page(to):
569
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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