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High-performance DUV inspection system for 100-nm generation masks

Author(s):
Tsuchiya, H. ( Toshiba Corp. (Japan) )
Isomura, I.
Nakashima, K.
Yamashita, K.
Watanabe, T.
Nishizaka, T.
Ikeda, H.
Sawa, E.
Ikeda, M. ( Toshiba Machine Co., Ltd. (Ｊａｐａｎ) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
526
Page(to):
533
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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