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Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation

Author(s):
Barberet, A. ( DuPont Photomasks (France) )
Buck, P.D. ( DuPont Photomasks, Inc. (USA) )
Fanget, G.L. ( CEA-LETI (France) )
Toublan, O. ( Mentor Graphics (France) )
Richoilley, J.-C. ( DuPont Photomasks (France) )
Tissier, M.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
460
Page(to):
470
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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