Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography
- Author(s):
Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yamabe, O. Kanda, N. Kim, J. Uchida, N. Irie, S. Suganaga, T. Itani, T. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 444
- Page(to):
- 451
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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