Optimization of Alt-PSM structure for 100-nm-node ArF lithography: II
- Author(s):
Mesuda, K. ( Dai Nippon Printing Co., Ltd. (Japan) ) Toyama, N. Narukawa, S. Morikawa, Y. Mohri, H. Hayashi, N. Hoga, M. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 396
- Page(to):
- 409
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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