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Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)

Author(s):
Yoon, S.-Y. ( PKL (Korea) )
Choi, S.-J.
Kim, Y.-D.
Lee, D.-H.
Cha, H.-S.
Kim, J.-M.
Choi, S.-S.
Jeong, S.H.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
332
Page(to):
340
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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