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In-situ optical emission spectroscopic examination of chrome etch for photomasks

Author(s):
Anderson, R. ( Applied Materials, Inc. (USA) )
Sandlin, N.
Buie, M.J.
Su, C. ( Photronics-PSMC (Taiwan) )
Agarwal, A. ( Applied Materials, Inc. (USA) )
Brooks, C.J.
Huang, Y.-C.
Stoehr, B. C.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
312
Page(to):
322
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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