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Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Author(s):
Choi, S.-J. ( PKL (Korea) )
Cha, H.-S.
Yoon, S.-Y.
Kim, Y.-D.
Lee, D.-H.
Kim, J.-M.
Kim, J.-S.
Min, D.-S.
Jang, P.-J.
Chang, B.-S.
Kwon, H.-J.
Choi, B.-Y.
Choi, S.-S.
Jeong, S.H.
9 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
303
Page(to):
311
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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