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Model of coating and drying process for flat polymer film fabrication

Author(s):
Kagami, H. ( Kumamoto Technology & Industry Foundation (Japan) )
Miyagawa, R. ( Kumamoto Industrial Research Institute (Japan) )
Kawata, A. ( Zeon Corp. (Japan) )
Nakashima, D ( Kumamoto Univ. (Japan) )
Kobayashi, S. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kitano, T.
Takeshita, K.
Kubota, H. ( Kumamoto Univ. (Japan) )
Ohmi, T. ( Tohoku Univ. (Japan) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
252
Page(to):
259
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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