
Lithography strategy for 65-nm node (Invited Paper)
- Author(s):
Borodovsky, Y.A. ( Intel Corp. (USA) ) Schenker, R.E. Allen, G.A. Tejnil, E. Hwang, D.H. Lo, F.-C. Singh, V.K. Gleason, R.E. Brandenburg, J.E. Bigwood, R.M. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 1
- Page(to):
- 14
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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