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Lithography strategy for 65-nm node (Invited Paper)

Author(s):
Borodovsky, Y.A. ( Intel Corp. (USA) )
Schenker, R.E.
Allen, G.A.
Tejnil, E.
Hwang, D.H.
Lo, F.-C.
Singh, V.K.
Gleason, R.E.
Brandenburg, J.E.
Bigwood, R.M.
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. date:
2002
Page(from):
1
Page(to):
14
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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