In-situ x-ray reflectivity measurement of the interface roughness of tantalum pentoxide thin film during rf magnetron sputtering deposition

In-situ x-ray reflectivity measurement of the interface roughness of tantalum pentoxide thin film during rf magnetron sputtering deposition

Author(s):

Lee, C.-H ( National Tsing Hua Univ. (Taiwan) )
Huang, T.-W
Lee, H.-Y. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Hsieh, Y.-W.

Publication title:

Nondestructive Evaluation and Reliability of Micro- and Nanomaterial Systems

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4703

Pub. Year:

2002

Page(from):

37

Page(to):

45

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444516 [0819444510]

Language:

English

Call no.:

P63600/4703

Type:

Conference Proceedings

Details

TDL ID:	ZA00012538
Series ID:	PA00000029
Conf. info. (Name):	Smart Structures : Nondestructive evaluation and reliability of micro- and nanomaterial systems
Conf. info. (Number):	2002
Conf. info. (Venue):	Newport Beach, USA
Conf. info. (Date):	2002.03.18-2002.03.19

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