248-nm photolithography compatibility on low-k dielectrics in BEOL interconnects

248-nm photolithography compatibility on low-k dielectrics in BEOL interconnects

Author(s):

Hong, H.S. ( Texas Instruments Inc.(USA) )
Xing, G.Q.
McKerrow, A.
Kim, T.S.
Smith, P.B.

Publication title:

Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4692

Pub. Year:

2002

Page(from):

547

Page(to):

554

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444394 [0819444391]

Language:

English

Call no.:

P63600/4692

Type:

Conference Proceedings

Details

TDL ID:	ZA00012527
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Design, process integration, and characterization for microelectronics
Conf. info. (Number):	2002
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.06-2002.03.07

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