Wafer-level fault detection and classification on a photo track in a high volume fab
- Author(s):
- Jackson, T.L. ( Advanced Micro Devices,Inc.(USA) )
- Markle, R.J.
- Miller, C.W.
- Stewart, E.C.
- Crowell, R.A. ( Tokyo Electron America )
- Publication title:
- Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4692
- Pub. Year:
- 2002
- Page(from):
- 128
- Page(to):
- 135
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444394 [0819444391]
- Language:
- English
- Call no.:
- P63600/4692
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Implementing Multiple ADC Systems in a High Production Sub-Half Micron Microprocessor Fab
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Real-time volume visualization of sensor data for target detection and classification
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Detection and classification of mines via discriminant features and borrowed strength
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
American Institute of Aeronautics and Astronautics |