Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
- Author(s):
- Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Kanda, N.
- Watanabe, K.
- Suganaga, T.
- Itani, T.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1654
- Page(to):
- 1664
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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