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Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Author(s):
Grenville, A. ( Intel Corp. (USA) )
Liberman, V. ( MIT Lincoln Lab. (USA) )
Rothschild, M.
Sedlacek, J.H.C.
French, R.H. ( DuPont Central Research (USA) )
Wheland, R.C.
Zhang, X. ( DuPont Photomasks, Inc. (USA) )
Gordan, J.
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1644
Page(to):
1653
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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