Aberration determination in early 157-nm exposure system
- Author(s):
Smith, B.W. ( Rochester Institute of Technology (USA) ) Conley, W. ( International SEMATECH (USA) ) Garza, C.M. ( Motorola (USA) ) Meute, J. ( International SEMATECH (USA) ) Miller, D.A. ( International SEMATECH (USA) ) Rich, G.K. Graffenberg, V. Dean, K.R. Patel, S. Ford, A. Foster, J. ( ASML (USA) ) Moers, M.H. ( ASML (Netherlands) ) Cummings, K.D. Webb, J.E. ( Corning Tropel Corp. (USA) ) Dewa, P.G. Zerrade, A. ( DuPont Photomasks, Inc. (USA) ) McDonald, S.S. Hughes, G.P. Dirksen, P. ( Philips Research Labs. (Belgium) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1635
- Page(to):
- 1643
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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