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Aberration determination in early 157-nm exposure system

Author(s):
Smith, B.W. ( Rochester Institute of Technology (USA) )
Conley, W. ( International SEMATECH (USA) )
Garza, C.M. ( Motorola (USA) )
Meute, J. ( International SEMATECH (USA) )
Miller, D.A. ( International SEMATECH (USA) )
Rich, G.K.
Graffenberg, V.
Dean, K.R.
Patel, S.
Ford, A.
Foster, J. ( ASML (USA) )
Moers, M.H. ( ASML (Netherlands) )
Cummings, K.D.
Webb, J.E. ( Corning Tropel Corp. (USA) )
Dewa, P.G.
Zerrade, A. ( DuPont Photomasks, Inc. (USA) )
McDonald, S.S.
Hughes, G.P.
Dirksen, P. ( Philips Research Labs. (Belgium) )
14 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part Two
Page(from):
1635
Page(to):
1643
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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