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Development of low-loss optical coatings for 157-nm lithography

Author(s):
Biro, R. ( Association of Super-Advanced Electronics Technologies (Japan) )
Sone, K. ( Canon Inc. (Japan) )
Niisaka, S. ( Association of Super-Advanced Electronics Technologies (Japan) )
Otani, M. ( Association of Super-Advanced Electronics Technologies (Japan) )
Suzuki, Y. ( Canon Inc. (Japan) )
Ouchi, C.
Saito, T. ( Association of Super- Advanced Electronics Technologies (Japan) )
Hasegawa, M. ( Association of Super-Advanced Electronics Technologies (Japan) )
Saito, J. ( Association of Super-Advanced Electronics Technologies (Japan) )
Tanaka, A. ( Nikon Corp. (Japan) )
Matsumoto, A.
6 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1625
Page(to):
1634
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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