Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography
- Author(s):
Oh, S.-Y. ( Hynix Semiconductor Inc. (Korea) ) Kim, W.-H. Yune, H.-S. Kim, H.-B. Kim, S.-M. Ahn, C.-N. Shin, K.-S. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1537
- Page(to):
- 1543
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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