Blank Cover Image

ArF imaging with off-axis illumination and subresolution asist bars: a compromise between mask constraints an lithographic process constraints

Author(s):
Trouiller, Y. ( CEA-LETI (France) )
Serrand, J. ( STMicroelectronics (France) )
Miramond, C.
Rody, Y.F. ( Philips Research Labs. (France) )
Manakli, S. ( STMicroelectronics (France) )
Goirand, P.-J.
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1522
Page(to):
1529
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach

Manakli, S., Trouiller. Y., Toublan, O., Schiavone, P., Miramond, C., Rody, Y.F., Sundermann, F., Chapon, J.D., Goirand, …

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Critical failure ORC: application to the 90-nm and 65-nm nodes

Belledent, J., Shang, S.D., Trouiller, Y., Miramond, C., Patterson, K., Toublan, O.R., Couderc, C., Sundermann, F., …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Gate imaging for 0.09-μm logic technology: comparison of single exposure with assist bars and the CODE approach

Trouiller, Y., Belledent, J., Chapon, J.D., Rousset, V., Rody, Y.F., Manakli, S., Goirand, P.-J.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Closing the defect printability loop: optimizing defect specifications for an established lithographic process

Patterson, K., Wakefield, C., Sixt, P., Sundermann, F., Trouiller, Y., Belledent, J., Couderc, C., Rody, Y., Lucas, K.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Using the CODE technique to print complex two-dimensional structures in a 90-nm ground rule process

Manakli, S., Trouiller, Y., Toublan, O., Schiavone, P., Rody, Y.F., Goirand, P.J.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings MEV as a new constraint for lithographers in the sub-100-nm regime

Trouiller, Y., Postnikov, S.V., Lucas, K.D., Sundermann, F., Patterson, K., Belledent, J., Couderc, C., Rody, Y.F.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings ArF lithography for printing 100-nm gates on low-volume ASIC devices: CD budget issues related to various binary mask-making processes

Trouiller,Y., Fanget,G.L., Miramond,C., Rody,Y.F.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Complementary double-exposure technique (CODE) solutions to the two-dimensional structures of 90-nm node

Manakil, S., Troullier, Y., Toublan, O., Schiavone, P., Rody, Y.F., Goirand, P.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Leap ahead in mask data processing for technology nodes below 130nm

Miramond,C., Goubier,D., Chomat,M., Trouiller,Y., Rody,Y.F., Toublan,O.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28]

Rody, Y., Martin, P., Couderc, C., Sixt, P., Gardin, C., Lucas, K., Patterson, K., Miramond-Collet, C., Belledent, J., …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Modeling of electromagnetic effects from mask topography at full-chip scale

Borjon, A., Belledent, J., Shang, S. D., Toublan, O., Miramond, C., Patterson, K., Lucas, K., Couderc, C., Rody, Y., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Correction of long-range effects applied to the 65-nm node [5853-107]

Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12