New resolution enhancement technology for manufacturing sub-100-nm technology
- Author(s):
Chung, D.-H. ( Smsung Electronics Co., Ltd. (Korea) ) Park, J.-Y. Lee, M.-K. Shin, I.-K. Choi, S.-W. Yoon, H.-S. Sohn, J.-M. Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1492
- Page(to):
- 1499
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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