New resolution enhancement technology for manufacturing sub-100-nm technology

New resolution enhancement technology for manufacturing sub-100-nm technology

Author(s):

Chung, D.-H. ( Smsung Electronics Co., Ltd. (Korea) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Van Den Broeke, D.J.

4 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1492

Page(to):

1499

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Development of mask-making process for CLM manufacturing technology Park, J.-H., Chung, D.-H., Lee, M.-K., Shin, I.-K., Choi, S.-W., Yoon, H.-S., Sohn, J.-M., Chen, J.F., Van Den Broeke, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Application of Cr-less mask technology for sub-100-nm gate with single exposure Kim, S.-H., Chung, D.-H., Park, J.S.., Shin, I.K., Choi, S.W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Chen, J.F., Van Den … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL Hsu, M., Laidig, T.L., Wampler, K.E., Hsu, S.D., Shi, X., Chen, J.F., Van Den Broeke, D.J., Hsieh, F. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography Park, J.-S., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Laidig, T.L., Van den Broeke, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings New approach for quartz dry etching using hardmask for sub-90-nm photomask technology Huh, S., Yoon, K.-S., Jang, I.-Y., Hwang, J.-H., Shin, I.-K., Choi, S.-W., Han, W.-S. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Phase defect printability analysis for chromeless phase lithography technology Huh, S., Park, J.H., Chung, D.-H., Kim, C.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering	12 Conference Proceedings The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55] Yoon, G.-S., Kim, S.-H., Park, J.-S., Choi, S.-Y., Jean, C.-U., Shin, I.-K., Choi, S.-W., Han, W.-S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12