MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm
- Author(s):
- Tan, S.K. ( National Univ. of Singapore )
- Lin, Q. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
- Chua, G.S. ( National Univ. of Singapore )
- Quan, C.
- Tay, C.J.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1366
- Page(to):
- 1372
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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