Blank Cover Image

New photomask substrate for improved lithography performance

Author(s):
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1331
Page(to):
1339
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Evaluation of new mask materials for improved lithography performance

Kasprowicz,B.S., Priestley,R.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Improved process control of photomask fabrication in e-beam lithography

Cha,B.-C., Park,J.-H., Choi,Y.-H., Kim,J.-M., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Birefringence dispersion in photomask substrates for DUV Lithography

Priestley,R.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

Majoni, S., Driessen, F.A., Kasprowicz, B.S., Harris, P.D.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Achieving low-wavefront specifications for DUV lithography: impact of residual stress in HPFS fused silica

Ladison,J.L., Ellison,J.F., Allan,D.C., Fladd,D.R., Fanning,A.W., Priestley,R.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Active membrane masks for improved overlay performance in proximity lithography

Huston, D.R., Plumpton, J., Esser, B., Sullivan, G.A.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography

Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer

Kasprowicz,B.S., Eynon,B.G., Morrison,T.B., Wang,C.-Y.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Comparison of 2D measurement methodologies and their viability in a manufacturing environment

Kasprowicz,B.S., Taylor,D., Hathorn,M.E.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Investigating inspectability and printability of contamination deposited during SEM analysis

Kasprowicz,B.S., Ananth,M., Wang,C.-Y.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Sol-gel fabrication of high-quality photomask substrates for 157-nm lithography

Ganguli, R., Colbern, S.G., Morris, M.W., Meixner, D.L., Roy Chaudhuri, S.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Application of critical shape analyses to two-dimensional patterns

Pochkowski,M., Mack,C.A., Kasprowicz,B.S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12