Tuning and simulating a 193-nm resist for 2D applications

Tuning and simulating a 193-nm resist for 2D applications

Author(s):

Howard, W.B. ( KLA-Tencor Corp. (USA) )

Wiaux, V. ( IMEC (Belgium) )

Ercken, M.

Bui, B. ( JSR Corp. (Belgium) )

Byers, J.D. ( KLA-Tencor Corp. (USA) )

Pochkowski, M.

1 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1190

Page(to):

1198

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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