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Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Author(s):
Driessen, F.A. ( Numerical Technologies, Inc. (USA) )
van Adrichem, P. ( IMEC (Belgium) )
Philipsen, V. ( IMEC (Belgium) )
Jonckheere, R.
Liu, H.-Y. ( Numerical Technologies, inc. (USA) )
Karklin, L.
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part Two
Page(from):
1180
Page(to):
1189
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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