New methods to calibrate simulation parameters for chemically amplified resists
- Author(s):
Tollkuehn, B. ( Fraunhofer-Institut fuer Integrierte Schaltungen (Germany) ) Erdmann, A. Kivel, N. ( Fraunhofer-Institut fuer Integrierte Schaltungen (Germany) ) Robertson, S.A. ( Shipley Co. L.L.C. (USA) ) Kang, D. Hansen, S.G. ( ASML (USA) ) Fumar-Pici, A. Chiou, T.-B. Hoppe, W. ( SIGMA-C GmbH (Germany) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1168
- Page(to):
- 1179
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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