Monte Carlo method for highly efficient and accurate statistical lithography simulations
- Author(s):
- Postnikov, S.V. ( Motorola (USA) )
- Lucas, K.
- Wimmer, K.
- Ivin, V. ( SOFT-TEC (Russia) )
- Rogov, A.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1118
- Page(to):
- 1126
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Investigation of product design weaknesses using model-based OPC sensitivity analysis
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Method of easily extracting resist development parameters for lithography simulation
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Fast modeling of 3D planar resist images for high-NA projection lithography
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Monte-Carlo simulation of the IR lens modulation transfer function determination
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Re-evaluating simple lambda-based design rules for low-K1 lithography process control
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Monte Carlo simulation of hopping transport in dipolar disordered organic matrices
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Monte Carlo simulation of charge carrier transport in locally ordered dipolar matrices
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Kluwer Academic Publishers |