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Model-based OPC considering process window aspects: a study

Author(s):
Schulze, S.F. ( Infineon Technologies Corp. (USA) )
Park, O.
Zimmermann, R. ( Infineon Technologies AG (Germany) )
Chen, M.-J. ( United Microelectronics Corp. (USA) )
LaCour, P. ( Mentor Graphics Corp. (USA) )
Sahouria, E.Y.
Granik, Y.
Cobb, N.
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part Two
Page(from):
1097
Page(to):
1105
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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