Model-based OPC considering process window aspects: a study

Model-based OPC considering process window aspects: a study

Author(s):

Schulze, S.F. ( Infineon Technologies Corp. (USA) )

Park, O.

Zimmermann, R. ( Infineon Technologies AG (Germany) )

Chen, M.-J. ( United Microelectronics Corp. (USA) )

LaCour, P. ( Mentor Graphics Corp. (USA) )

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1097

Page(to):

1105

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation Granik,Yu., Cobb,N.B., Sahouria,E.Y., Toublan,O., Capodieci,L., Socha,R.J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Chip-level line-width prediction methodology LaCour, P., Sahouria, E.Y., Granik, Y. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Integration of OPC and mask data preparation Schulze, S.F., LaCour, P.J., Rodriguez, N. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Universal process modeling with VTRE for OPC Granik, Y., Cobb, N., Do, T. SPIE-The International Society for Optical Engineering
3 Conference Proceedings OASIS-based unification of mask data representation Sahouria, E.Y., Schulze, S.F. SPIE - The International Society of Optical Engineering	9 Conference Proceedings OPC methods to improve image slope and process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Model-based OPC using the MEEF matrix Cobb, N,B,, Granik, Y. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Using OPC to optimize for image slope and improve process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering
6 Conference Proceedings CD variation analysis technique and its application to the study of PSM mask misalignment Granik,Y., Cobb,N.B., Sahouria,E.Y. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Toward standard process models for OPC Y. Granik, D. Medvedev, N. Cobb SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12