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Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

Author(s):
Patterson, K. ( Motorola (USA) )
Litt, L.C.
Maltabes, J.G.
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Robertson, T. ( Motorola (USA) )
Montgomery, B.
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part Two
Page(from):
1033
Page(to):
1040
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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