Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
- Author(s):
Patterson, K. ( Motorola (USA) ) Litt, L.C. Maltabes, J.G. Hughes, G.P. ( DuPont Photomasks, Inc. (USA) ) Robertson, T. ( Motorola (USA) ) Montgomery, B. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1033
- Page(to):
- 1040
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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