Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

Author(s):

Patterson, K. ( Motorola (USA) )

Litt, L.C.

Maltabes, J.G.

Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )

Robertson, T. ( Motorola (USA) )

Montgomery, B.

1 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. date:

2002

Vol.:

Part Two

Page(from):

1033

Page(to):

1040

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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