Integration of new alignment mark designs in dual inlaid-copper interconnect processes
- Author(s):
Warrick, S.P. ( Motorola (USA) ) Hinnen, P.C. ( ASML (Netherlands) ) van Haren, R.J. Smith, C.J. ( Motorola (USA) ) Megens, H.J. ( ASML (Netherlands) ) Fu, C.-C. ( Motorola (USA) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 971
- Page(to):
- 980
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Development of a Copper CMP Process for Multilevel, Dual Inlaid Metallization in Semiconductor Devices
Electrochemical Society |
2
Conference Proceedings
Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
3
Conference Proceedings
Advances in process overlay: ATHENA alignment system performance on critical process layers
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
A methodology for the characterization of topography induced immersion bubble defects
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Advances in process overlay: alignment solutions for future technology nodes
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Alignment and overlay metrology issues for copper/low-K dual-damascene interconnect
SPIE - The International Society of Optical Engineering |