0.33-k1 ArF lithography for 100-nm DRAM

0.33-k1 ArF lithography for 100-nm DRAM

Author(s):

Bok, C.K. ( Hynix Smiconductor Inc. (Korea) )

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. date:

2002

Vol.:

Part Two

Page(from):

810

Page(to):

821

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography Kim, S.-K., Bok, C.-K., Shin, K.-S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography Oh, S.-Y., Kim, W.-H., Yune, H.-S., Kim, H.-B., Kim, S.-M., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Feasibility study of printing sub-100-nm with ArF lithography Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings ArF lithography options for 100-nm technologies Vandenberghe,G.N., Kim,Y.-C., Delvaux,C., Lucas,K.D., Choi,S.-J., Ercken,M., Ronse,K., Vleeming,B. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography You, T.-J., Bok, C.-K., Shin, K.-S. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography Lee, G., Hwang, Y.S., Ban, K.D., Bok, C.K., Moon, S.C., Shin, K.S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12