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0.33-k1 ArF lithography for 100-nm DRAM

Author(s):
Bok, C.K. ( Hynix Smiconductor Inc. (Korea) )
Kim, S.-K.
Kim, H.-B.
Oh, J.-S.
Ahn, C.-N.
Shin, K.-S.
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part Two
Page(from):
810
Page(to):
821
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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