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Analysis of wafer flatness for CD control in photolithography

Author(s):
Fujisawa, T. ( Toshiba Corp. (Japan) )
Asano, M.
Sutani, T.
Inoue, S.
Yamada, H.
Sugamoto, J.
Okumura, K. ( Univ. of Tokyo (Japan) )
Hagiwara, T. ( Nikon Corp. (Japan) )
Oka, S. ( Shin-Etsu Handotai Co., Ltd. (Japan) )
4 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
802
Page(to):
809
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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