Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength
- Author(s):
- Okoroanyanwu, U. ( Advanced Micro Devices, Inc. (USA) )
- Kunze, P. ( Carl von Ossietzky Univ. Oldenburg (Germany) )
- Al-Shamery, K.H.
- Romero, J. ( Advanced Micro Devices, Inc. (USA) )
- Bernard, J.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 746
- Page(to):
- 764
- Pages:
- 19
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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