Blank Cover Image

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Author(s):
Meute, J. ( IBM Corp. (USA) )
Rich, G.K. ( International SEMATECH (USA) )
Hien, S. ( Infineon Technologies Corp. (USA) )
Dean, K.R. ( International SEMATECH (USA) )
Gondran, C.
Cashmore, J.S. ( Exitech Ltd. (USA) )
Ashworth, D.
Webb, J.E. ( Corning Tropel Corp. (USA) )
Rich, L.R.
Dewa, P.G.
5 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
724
Page(to):
733
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Correction of 157-nm lens based on phase ring aberration extraction method

Meute, J., Rich, G.K., Conley, W., Smith, B.W., Zavyalova, L.V., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Image performance and mask characterization of 157-nm alternating phase-shifting mask

Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Aberration determination in early 157-nm exposure system

Smith, B.W., Conley, W., Garza, C.M., Meute, J., Miller, D.A., Rich, G.K., Graffenberg, V., Dean, K.R., Patel, S., Ford, …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings 157-nm system test for high-NA lithographic lens systems

Schreiber, H., Dewa, P.G., Hanford, K.E., Ligenza, R.L., Rich, L.R., Tompkins, P.J.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Photoresist outgassing at 157-nm exposure

Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Aberration evaluation and tolerancing of 193-nm lithographic objective lenses

Smith,B.W., Webb,J.E., Petersen,J.S., Meute,J.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?

Meute, J.J., Rich, G., Turnquest, K., Dean, K., Patel, S., Graffenberg, V.L., Rodriguez, M.P.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Optical metrology for 193-nm immersion objective characterization

Aronstein, D., Bentley, J., Dewa, P.G., Dunn, M., Schreiber, H., Nguyen, T., Webb, J.E.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Parameter extraction for 157-nm photoresists

Bendik, J.J., Conley, W., Miller, D.A., Zimmerman, P., Dean, K.R., Petersen, J.S., Byers, J.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Applications of a grating shearing interferometer at 157 nm

Schreiber,H., Dewa,P.G., Dunn,M.M., Hordin,R., Mack,S.K., Statt,B.D., Tompkins,P.J.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings 157-nm alternating phase-shifting mask design and high-NA images

Chen, Y.-T., Meute, J., Dean, K., Brooker, P.D.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 157-nm Twyman-Green interferometer for lens testing

Statt,B.D., Dewa,P.G., Mack,S.K., Schreiber,H., Stone,B.D., Tompkins,P.J.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12