Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Author(s):

Bloomstein, T.M. ( MIT Lincoln Lab. (USA) )

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part One

Page(from):

709

Page(to):

723

Pages:

15

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists Bloomstein, T.M., Sedlacek, J.H.C., Palmacci, S.T., Hardy, D.E., Liberman, V., Rothschild, M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Marathon evaluation of optical materials for 157-nm lithography Liberman,V., Rothschild,M., Efremow Jr.,N.N., Palmacci,S.T., Sedlacek,J.H.C., Peski,C.K.Van, Orvek,K.J. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Photo-induced changes in 157-nm optical coatings Liberman, V., Bloomstein, T.M., Rothschild, M., Palmacci, S.T., Sedlacek, J.H.C., Grenville, A. SPIE - The International Society of Optical Engineering	8 Conference Proceedings UV cleaning of contaminated 157-nm reticles Bloomstein,T.M., Liberman,V., Rothschild,M., Efremow Jr.,N.N., Hardy,D.E., Palmacci,S.T. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O V. Liberman, M. Switkes, M. Rothschild, S.T. Palmacci, J.H.C. Sedlacek, D.E. Hardy, A. Grenville SPIE - The International Society of Optical Engineering	9 Conference Proceedings Controlled contamination of optics under 157-nm laser irradiation Bloomstein,T.M., Liberman,V., Palmacci,S.T., Rothschild,M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Laser cleaning of optical elements in 157-nm lithography Bloomstein,T.M., Rothschild,M., Liberman,V., Hardy,D.E., Efremow,N.N.,Jr., Palmacci,S.T. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Long-term laser durability testing of optical coatings and thin films for 157-nm lithography Liberman, V., Rorhschild, M., Palmacci, S.T., Efremow, N.N., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Ambient effects on the laser durability of 157-nm optical coatings Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Determination of optical properties of thin films and surfaces in 157-nm lithography Liberman,V., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Optical materials and coatings at 157 nm Bloomstein,T.M., Liberman,V., Rothschild,M., Hardy,D.E., Goodman,R.B. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12