157-nm technology: Where are we today?

157-nm technology: Where are we today?

Author(s):

Mulkens, J. ( ASML (Netherlands) )

Fahey, T.J. ( ASML (USA) )

McClay, J.A.

Stoeldraijer, J.M. ( ASML (Netherlands) )

Wong, P.

Brunotte, M. ( Carl Zeiss (Germany) )

Mecking, B.

2 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part One

Page(from):

613

Page(to):

625

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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