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Solutions for printing sub-100-nm contacts with ArF

Author(s):
Graeupner, P. ( Carl Zeiss (Germany) )
Goehnermeier, A.
Lowisch, M.
Garreis, R.B.
Flagello,D.G. ( ASML (USA) )
Hansen, S.G.
Socha, R.J.
Koehler, C. ( ASML (Netherlands) )
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part One
Page(from):
503
Page(to):
514
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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