Solutions for printing sub-100-nm contacts with ArF

Solutions for printing sub-100-nm contacts with ArF

Author(s):

Graeupner, P. ( Carl Zeiss (Germany) )

Goehnermeier, A.

Lowisch, M.

Garreis, R.B.

Flagello,D.G. ( ASML (USA) )

Hansen, S.G.

Socha, R.J.

Koehler, C. ( ASML (Netherlands) )

3 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part One

Page(from):

503

Page(to):

514

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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