Solutions for printing sub-100-nm contacts with ArF

Solutions for printing sub-100-nm contacts with ArF

Author(s):

Graeupner, P. ( Carl Zeiss (Germany) )

Goehnermeier, A.

Lowisch, M.

Garreis, R.B.

Flagello,D.G. ( ASML (USA) )

Hansen, S.G.

Socha, R.J.

Koehler, C. ( ASML (Netherlands) )

3 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. date:

2002

Vol.:

Part One

Page(from):

503

Page(to):

514

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Impact of wavefront errors on low k1 processes at extremely high NA Graeupner, P., Garreis, R.B., Goehnermeier, A., Heil, T., Lowisch, M., Flagello, D.G. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications Klerk, J., Jorritsma, L., Setten, E., Droste, R., Jongh, R.C., Hansen, S.G., Smith, D., Kerkhof, M.A., Mast, F., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Optical lithography in the sub-50-nm regime Flagello, D.G., Arnold, B., Hansen, S., Dusa, M., Socha, R.J., Mulkens, J., Garreis, R. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Forbidden pitches for 130-nm lithography and below Socha,R.J., Dusa,M.V., Capodieci,L., Finders,J., Chen,J.F., Flagello,D.G., Cummings,K.D. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Can DUV take us below 100 nm? Finders,J., Jorritsma,L., Eurlings,M., Moerman,R., Greevenbroek,H.van, Schoot,J.B.van, Flagello,D.G., Socha,R.J., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches Kim, K., Choi, Y.S., Socha, R.J., Flagello, D.G. SPIE-The International Society for Optical Engineering
4 Conference Proceedings CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Feasibility study of printing sub-100-nm with ArF lithography Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Understanding illumination effects for control of optical proximity effects (OPE) D. G. Flagello, B. Geh, R. Socha, P. Liu, Y. Cao Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Optimizing and enhancing optical systems to meet the low k1 challenge Flagello, D.G., Socha, R.J., Shi, X., Schoot, J.B., Baselmans, J., Kerkhof, M.A., Boeij, W., Engelen, A., Carpaij, R., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Implementation of the ArF resists based on VEMA for sub-100-nm device Kim, H.-W., Lee, S., Choi, S.-J., Lee, S.-H., Kang, Y., Woo, S.-G., Nam, D.S., Chae, Y.-S., Kim, J.S., Moon, J.-T., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12