Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
- Author(s):
Kim, I.-S. ( Samsung Electronics Co., Ltd. (Korea) ) Jung, S.-G. Kim, H.-D. Yeo, G.-S. Shin, I.-K. Lee, J.-H. Cho, H.-K. Moon, J.-T. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 466
- Page(to):
- 475
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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