Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Author(s):

Socha, R.J. ( ASML (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Yu, L.

Conley, W. ( Motorola (USA) )

Wu, W.

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )

Gerold, D.J.

van Praagh, J. ( ASML (Netherlands) )

Droste, R.

Flagello, D.G. ( ASML (USA) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

7 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part One

Page(from):

446

Page(to):

458

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

Similar Items:

1 Conference Proceedings Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N.P., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view Shi, X., Chen, J.F., Hsu, S., Van Den Broeke, D.J., Socha, R.J., Chang, C.H., Dai, C.-M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL) Hsu, C., Chu, R., Chen, J.F., Van Den Broeke, D.J., Shi, X., Hsu, S.D., Wang, T. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC Roy, S., Van Den Broeke, D.J., Chen, J.F., Liebchen, A., Chen, T., Hsu, S.D., Shi, X., Socha, R.J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings 65-nm full-chip implementation using double dipole lithography Hsu, S.D., Chen, J.F., Cororan, N., Knose, W.T., Broeke, D.J.V.D., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, C.M., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12