Blank Cover Image

Minimization of image placement errors in chromeless phase-shift mask lithography

Author(s):
Fritze, M. ( MIT Lincoln Lab. (USA) )
Tyrrell, B.
Cann, S.G.
Carney, C. ( Arch Chemicals, Inc. (USA) )
Blachowicz, B.A.
Brzozowy, D.
Kocab, T.
Bowdoin, S. ( Schlumberger Ltd. (USA) )
Rhyins, P.D. ( Photronics Inc. (USA) )
Progler, C.J.
Martin, P.
6 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
426
Page(to):
436
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node

Rhyins,P., Fritze,M., Chan,D., Carney,C., Blachowicz,B.A., Vieira,M., Mack,C.A.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Fritze,M., Burns,J.M., Wyatt,P.W., Astolfi,D.K., Forte,T., Yost,D., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., …

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography

Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings 100-nm node lithography with KrF?

Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., …

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Minimization of mask transmission asymmetry effect for chromeless phase-shift masks

Chan,D., Novak,J.W., Fritze,M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Minimizing mask complexity for advanced optical lithography

Fritze, M., Tyrrell, B.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns

Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., …

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Dense only phase-shift template lithography

Fritze, M., Tyrrell, B., Mallen, R.D., Wheeler, B., Rhyins, P.D., Martin, P.M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Device and lithography contextual mask rule generation

Ham, Y. M., Dillon, B., Progler, C., Goldammer, K., Jin, Z., Green, G., Mackay, R. S., Divecha, H., Boksha, V., Martin, …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

Tyrrell, B., Fritze, M., Mallen, R.D., Wheeler, B., Rhyins, P.D., Martin, P.M.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Manufacturabilily study of masks created by inverse lithography technology (ILT) [5992-106]

Martin, P. M., Progler, C. J., Xiao, G., Gray, R., Pang, L., Liu, Y.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12