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Minimization of image placement errors in chromeless phase-shift mask lithography

Author(s):
Fritze, M. ( MIT Lincoln Lab. (USA) )
Tyrrell, B.
Cann, S.G.
Carney, C. ( Arch Chemicals, Inc. (USA) )
Blachowicz, B.A.
Brzozowy, D.
Kocab, T.
Bowdoin, S. ( Schlumberger Ltd. (USA) )
Rhyins, P.D. ( Photronics Inc. (USA) )
Progler, C.J.
Martin, P.
6 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part One
Page(from):
426
Page(to):
436
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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