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Subresolution assist feature implementation for high-performance logic gate-level lithography

Author(s):
Gabor, A.H. ( IBM Microelectronics (USA) )
Bruce, J.
Chu, W.
Ferguson, R.
Fonseca, C.A.
Gordon, R.L.
Jantzen, K.
Khare, M.
Lavin, M.
Lee, W.-H.
Liebmann, L.W.
Muller, k.P.
Rankin, J.
Varekamp, P.
Zach, F.X.
10 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
418
Page(to):
425
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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