Assessment of OPC effectiveness using two-dimensional metrics
- Author(s):
Wiaux, V. ( IMEC (Belgium) ) Philipsen, V. Jonckheere, R. Vandenberghe, G. Verhaegen, S. Hoffmann, T. Ronse, K. Howard, W.B. ( KLA-Tencor Corp. (USA) ) Maurer, W. Preil, M.E. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 395
- Page(to):
- 406
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Optical extensions integration for a 0.314-μm2 45-nm node 6-transistor SRAM cell
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Feature proximity errors on mask: assessment results of commercially obtained reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
CD control comparison for sub-0.18-ヲフm patterning using 248-nm lithography and strong resolution enhancement techniques
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |