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Hybrid PPC methodology and implementation in the correction of etch proximity

Author(s):
Park, C.-H. ( Samsung Electronics Co., Ltd. (Korea) )
Rhie, S.-U.
Chio, S.-H.
Kim, D.-H.
Park, J.-S.
Kim, Y.-H.
Yoo, M.-H.
Kong, J.-T.
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
369
Page(to):
376
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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