Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
- Author(s):
Lai, K. ( IBM Microelectronics (USA) ) Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) ) Rosenbluth, A.E. Fonseca, C.A. ( IBM Microelectronics (USA) ) Liebmann, L.W. Progler, C.J. ( IBM Corp. (USA) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 336
- Page(to):
- 347
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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