Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Author(s):

Lai, K. ( IBM Microelectronics (USA) )

Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Rosenbluth, A.E.

Fonseca, C.A. ( IBM Microelectronics (USA) )

Liebmann, L.W.

Progler, C.J. ( IBM Corp. (USA) )

1 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. date:

2002

Vol.:

Part One

Page(from):

336

Page(to):

347

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012525
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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