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Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Author(s):
Lai, K. ( IBM Microelectronics (USA) )
Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )
Rosenbluth, A.E.
Fonseca, C.A. ( IBM Microelectronics (USA) )
Liebmann, L.W.
Progler, C.J. ( IBM Corp. (USA) )
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part One
Page(from):
336
Page(to):
347
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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