Analysis of focus errors in lithography using phase-shift monitors
- Author(s):
La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) ) Dusa, M.V. ( ASML (USA) ) Krist, J. Acheta, A. ( Advanced Micro Devices, Inc. (USA) ) Kye, J. Levinson, H.J. Luijten, C. ( ASML (USA) ) Sager, C.B. ( Benchmark Technoloties, Inc. (USA) ) Thomas, J. ( Advanced Micro Devices, Inc. (USA) ) van Praagh, J. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 315
- Page(to):
- 324
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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