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CD uniformity improvement by active scanner corrections

Author(s):
van Schoot, J.B. ( ASML (Netherlands) )
Noordman, O.
Vanoppen, P.
Blok, F.
Yim, D. ( Hynix Semiconductor Inc. (Korea) )
Park, C.-H.
Cho, B.-H.
Theeuwes, T. ( ASML (Korea) )
Min, Y.-H.
4 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. date:
2002
Vol.:
Part One
Page(from):
304
Page(to):
314
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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